25-26 September 2020
Taras Shevchenko National University of Kyiv
Europe/Kiev timezone

Transport Properties of SOI MOS Transistors

25 Sep 2020, 15:10
25m
Online (Taras Shevchenko National University of Kyiv)

Online

Taras Shevchenko National University of Kyiv

64/13, Volodymyrska Street, City of Kyiv, Ukraine, 01601
Invited Lecturer Afternoon Session

Speaker

Dr Kateryna Zelenska (Shizuoka University )

Description

Si-based metal-oxide-semiconductor field-effect transistors (MOSFETs) are widely used in high-density integrated circuits for amplifying and switching electronic signals. MOS transistors produced by the silicon on insulator (SOI) technology yield a high switching speed, reduced power consumption and provide a flexible architecture by varying such parameters as thickness of a Si layer and buried oxide layer, substrate doping and back gate voltage. Due to the device structure and ability to form conductive front and back channels for electrons (holes) under applying a certain voltage to the upper and back gate, the MOSFET systems find its application for modeling a 2-dimentional electron (hole) gas (2DEG, 2DHG) in charge transport research. Electron transport properties of the SOI MOS transistors at low temperatures were studied. Possible electronic processes and electron scattering mechanisms in the channels are discussed.

Topics Session A. Physics of condensed matter and spectroscopy

Primary author

Dr Kateryna Zelenska (Shizuoka University )

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